Bibliografie

Detailansicht

Predictive Simulation of Semiconductor Processing

Status and Challenges, Springer Series in Materials Science 72
Springer Verlag GmbH
ISBN/EAN: 9783540204817
Umbreit-Nr.: 750096

Sprache: Englisch
Umfang: xvii, 490 S., 161 s/w Illustr., 16 farbige Illustr
Format in cm:
Einband: gebundenes Buch

Erschienen am 05.05.2004
€ 213,99
(inklusive MwSt.)
Lieferbar innerhalb 1 - 2 Wochen
Beim Buchhandel bestellen
  • Zusatztext

    • Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.

  • Kurztext

    • Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.

  • Autorenportrait
    • Inhaltsangabe1 Transistors and Atoms.- 2 Atomistic Simulations of Processes at Surfaces.- 3 Atomistic Simulations in Materials Processing.- 4 Atomistic Simulation of Decanano MOSFETs.- 5 Modeling and Simulation of Heterojunction Bipolar Transistors.- 6 Gate Oxide Reliability: Physical and Computational Models.- 7 High-K Dielectrics: The Example of Pr2O3.- 8 Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3.- 9 Interconnects and Propagation of High Frequency Signals.- 10 Modeling of Electromigration in Interconnects.- 11 Predictive Modeling of Transition Metal Gettering: Applications and Materials Science Challenges.